Synthesis and characterization of the rheological behavior of MR fluid for polishing silicon wafer using double-disc chemical-assisted magneto-rheological finishing process

Engineering

• Finishing Process 100%
• Rheological Behavior 100%
• Silicon Wafer 100%
• Yield Stress 66%
• Fluid Viscosity 66%
• Experimental Result 33%
• Constitutive Equation 33%
• Fluid Model 33%
• Base Fluid 33%
• Flow Behavior 33%
• Material Removal Process 33%
• Applied Magnetic Field 33%
• Plate Rheometer 33%
• Abrasive 33%
• Monocrystalline Silicon 33%
• Rheometer 33%
• Parallel Plate 33%
• Magnetic Field 33%
• Aluminum Oxide 33%
• Saturation Magnetization 33%
• Iron Powder 33%
• Brittle Material 33%

Keyphrases

• Magnetorheological Fluid 100%
• Double Disc 100%
• Chemical-assisted 100%
• Magnetorheological Finishing 100%
• Herschel-Bulkley 11%
• Rheometer 11%
• Bingham Plastic 11%
• Finishing Tool 11%
• Carbonyl Iron 11%
• Alumina Abrasive 11%
• Wafer Surface 11%
• Monocrystalline Silicon Wafer 11%
• Rheological Data 11%
• Bingham Fluid 11%
• Parallel Plate Rheometer 11%
• Casson 11%

Material Science

• Yield Stress 100%
• Silicon Wafer 100%
• Magnetic Property 50%
• Silicon 50%
• Aluminum Oxide 50%
• Magnetometer 50%
• Brittleness 50%
• Iron Powder 50%