Abstract
Nitrogen doped porous TiO2 (N-TiO2) coating was developed from titanium nitride (TiN) by micro-arc oxidation (MAO), whereas TiN was prepared by plasma nitriding on commercially pure (Cp) titanium. The surface roughness of the N-TiO2 coating was greater than that of the TiO2 coating due to different MAO processing parameters. The band gap energy of N-TiO2 coating was reduced to 2.92 eV compared to TiO2 coating. The band gap energy reduction of N-TiO2 was attributed to nitrogen doping and the mixture of anatase, rutile and new phase (TiN0.30). The photoluminescence study demonstrated that the recombination rate of photo-generated electron–hole pairs of TiO2 was significantly suppressed after doping with nitrogen. N-TiO2 exhibited higher photocatalytic activity towards methylene blue dye degradation than to pure TiO2 coating. The recyclability test of N-TiO2 coating showed constant photocatalytic efficiency after the fourth run. Hence, N-TiO2 porous coating could be a promising material for immobilised solar photocatalytic applications.
Original language | English |
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Pages (from-to) | 779-786 |
Number of pages | 8 |
Journal | Surface Engineering |
Volume | 33 |
Issue number | 10 |
DOIs | |
Publication status | Published - 3 Oct 2017 |
Externally published | Yes |
Keywords
- Anatase
- MAO
- N-TiO
- Photocatalytic activity
- Plasma nitriding
- Rutile
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry