Progress in optimization of physical vapor deposition of thin films

Fredrick Mwema, Esther T. Akinlabi, Oluseyi Philip Oladijo

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review


In this chapter, the current state of the art in optimization of thin film deposition processes is discussed. Based on the reliable and credible published results, the study aims to identify the applications of various optimization techniques in the thin film deposition processes, with emphasis on physical deposition methods. These methods are chosen due to their attractive attributes over chemical deposition techniques for thin film manufacturing. The study identifies the critical parameters and factors, which are significant in designing of the optimization algorithms based on the specific deposition methods. Based on the specific optimization studies, the chapter provides general trends, optimization evaluation criteria, and input-output parameter relationships on thin film deposition. Research gaps and directions for future studies on optimization of physical vapor deposition methods for thin film manufacturing are provided.

Original languageEnglish
Title of host publicationData-Driven Optimization of Manufacturing Processes
PublisherIGI Global
Number of pages17
ISBN (Electronic)9781799872085
ISBN (Print)1799872068, 9781799872061
Publication statusPublished - 25 Dec 2020
Externally publishedYes

ASJC Scopus subject areas

  • General Engineering
  • General Computer Science
  • Economics, Econometrics and Finance (all)
  • General Business,Management and Accounting


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