Possibilities of HfO 2 for double-pole four-throw double-gate RF CMOS switch

Viranjay M. Srivastava, G. Singh, K. S. Yadav

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

In this paper, we have designed a Double-Pole Four-Throw (DP4T) RF CMOS switch, using Double-Gate (DG) MOSFET which has a high dielectric Hafnium-dioxide (HfO 2) in place of Silicon-dioxide (SiO 2). The performance of HfO 2 for the switch such as an effective ON-resistance, attenuation, flat-band capacitance, average dynamic power, doping densities, Debye length, and mobility of carriers, barrier heights and working efficiency at high temperature has been discussed. The results for the analysis of this DP4T DG RF CMOS switch with HfO 2 includes the basics of the circuit elements required as integrated circuits for the radio frequency communication systems.

Original languageEnglish
Title of host publicationProceedings - 2011 4th IEEE International Symposium on Microwave, Antenna, Propagation and EMC Technologies for Wireless Communications, MAPE 2011
Pages309-312
Number of pages4
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event2011 4th IEEE International Symposium on Microwave, Antenna, Propagation and EMC Technologies for Wireless Communications, MAPE 2011 - Beijing, China
Duration: 1 Nov 20113 Nov 2011

Publication series

NameProceedings - 2011 4th IEEE International Symposium on Microwave, Antenna, Propagation and EMC Technologies for Wireless Communications, MAPE 2011

Conference

Conference2011 4th IEEE International Symposium on Microwave, Antenna, Propagation and EMC Technologies for Wireless Communications, MAPE 2011
Country/TerritoryChina
CityBeijing
Period1/11/113/11/11

Keywords

  • CMOS Switch
  • DP4T Switch
  • Double-Gate MOSFET
  • Hafnium-dioxide
  • High Dielectric
  • RF Switch
  • Radio Frequency
  • VLSI

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electrical and Electronic Engineering

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