Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films

F. M. Mwema; E. T. Akinlabi; O. P. Oladijo

doi:10.1016/j.matpr.2020.02.309

Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films

F. M. Mwema, E. T. Akinlabi, O. P. Oladijo

Mechanical Engineering Science

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.

Original language	English
Pages (from-to)	1496-1499
Number of pages	4
Journal	Materials Today: Proceedings
Volume	26
DOIs	https://doi.org/10.1016/j.matpr.2020.02.309
Publication status	Published - 2019
Event	10th International Conference of Materials Processing and Characterization, ICMPC 2020 - Mathura, India Duration: 21 Feb 2020 → 23 Feb 2020

Keywords

Aluminum thin films
Microstructure
Sputtering
Substrate
Surface roughness

ASJC Scopus subject areas

General Materials Science

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10.1016/j.matpr.2020.02.309

Cite this

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title = "Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films",

abstract = "In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.",

keywords = "Aluminum thin films, Microstructure, Sputtering, Substrate, Surface roughness",

author = "Mwema, {F. M.} and Akinlabi, {E. T.} and Oladijo, {O. P.}",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the 10th International Conference of Materials Processing and Characterization.; 10th International Conference of Materials Processing and Characterization, ICMPC 2020 ; Conference date: 21-02-2020 Through 23-02-2020",

year = "2019",

doi = "10.1016/j.matpr.2020.02.309",

language = "English",

volume = "26",

pages = "1496--1499",

journal = "Materials Today: Proceedings",

issn = "2214-7853",

publisher = "Elsevier Ltd.",

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TY - JOUR

T1 - Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films

AU - Mwema, F. M.

AU - Akinlabi, E. T.

AU - Oladijo, O. P.

N1 - Publisher Copyright: © 2019 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the 10th International Conference of Materials Processing and Characterization.

PY - 2019

Y1 - 2019

N2 - In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.

AB - In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.

KW - Aluminum thin films

KW - Microstructure

KW - Sputtering

KW - Substrate

KW - Surface roughness

UR - http://www.scopus.com/inward/record.url?scp=85089026370&partnerID=8YFLogxK

U2 - 10.1016/j.matpr.2020.02.309

DO - 10.1016/j.matpr.2020.02.309

M3 - Conference article

AN - SCOPUS:85089026370

SN - 2214-7853

VL - 26

SP - 1496

EP - 1499

JO - Materials Today: Proceedings

JF - Materials Today: Proceedings

T2 - 10th International Conference of Materials Processing and Characterization, ICMPC 2020

Y2 - 21 February 2020 through 23 February 2020

ER -

Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films

Abstract

Keywords

ASJC Scopus subject areas

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