Micromorphology and nanomechanical characteristics of sputtered aluminum thin films

F. M. Mwema; E. T. Akinlabi; O. P. Oladijo

doi:10.1002/mawe.201900252

Micromorphology and nanomechanical characteristics of sputtered aluminum thin films

F. M. Mwema, E. T. Akinlabi, O. P. Oladijo

Mechanical Engineering Science

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Micromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.

Original language	English
Pages (from-to)	787-791
Number of pages	5
Journal	Materialwissenschaft und Werkstofftechnik
Volume	51
Issue number	6
DOIs	https://doi.org/10.1002/mawe.201900252
Publication status	Published - 1 Jun 2020

Keywords

Aluminum
magnetron sputtering
mono-fractal
multifractal
sputtering temperature
thin films

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1002/mawe.201900252

Cite this

@article{5a48513d728f449fad0b8031182f659d,

title = "Micromorphology and nanomechanical characteristics of sputtered aluminum thin films",

abstract = "Micromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.",

keywords = "Aluminum, magnetron sputtering, mono-fractal, multifractal, sputtering temperature, thin films",

author = "Mwema, {F. M.} and Akinlabi, {E. T.} and Oladijo, {O. P.}",

note = "Publisher Copyright: {\textcopyright} 2020 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim",

year = "2020",

month = jun,

day = "1",

doi = "10.1002/mawe.201900252",

language = "English",

volume = "51",

pages = "787--791",

journal = "Materialwissenschaft und Werkstofftechnik",

issn = "0933-5137",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - Micromorphology and nanomechanical characteristics of sputtered aluminum thin films

AU - Mwema, F. M.

AU - Akinlabi, E. T.

AU - Oladijo, O. P.

PY - 2020/6/1

Y1 - 2020/6/1

N2 - Micromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.

AB - Micromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.

KW - Aluminum

KW - magnetron sputtering

KW - mono-fractal

KW - multifractal

KW - sputtering temperature

KW - thin films

UR - http://www.scopus.com/inward/record.url?scp=85086307439&partnerID=8YFLogxK

U2 - 10.1002/mawe.201900252

DO - 10.1002/mawe.201900252

M3 - Article

AN - SCOPUS:85086307439

SN - 0933-5137

VL - 51

SP - 787

EP - 791

JO - Materialwissenschaft und Werkstofftechnik

JF - Materialwissenschaft und Werkstofftechnik

IS - 6

ER -

Micromorphology and nanomechanical characteristics of sputtered aluminum thin films

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this