Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Anne Vuorema; Mika Sillanpää; Karen J. Edler; Robben Jaber; Sara E.C. Dale; Simon Bending; Yunfeng Gu; Kamran Yunus; Adrian C. Fisher; Frank Marken

doi:10.1002/elan.201200141

Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Anne Vuorema
, Mika Sillanpää
, Karen J. Edler
, Robben Jaber
, Sara E.C. Dale
, Simon Bending
, Yunfeng Gu
, Kamran Yunus
, Adrian C. Fisher
, Frank Marken

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

"Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)₆^4- in aqueous KNO₃ strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

Original language	English
Pages (from-to)	1296-1305
Number of pages	10
Journal	Electroanalysis
Volume	24
Issue number	6
DOIs	https://doi.org/10.1002/elan.201200141
Publication status	Published - Jun 2012
Externally published	Yes

Keywords

Electrodeposition
Gold
Membrane
Membrane sensor
Poly-electrolyte
Silica
Sputter-coating
Tin-doped indium oxide
Voltammetry

ASJC Scopus subject areas

Analytical Chemistry
Electrochemistry

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10.1002/elan.201200141

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@article{9fd23586ec4d4365b169dd8451088e3c,

title = "Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores",

abstract = "{"}Simple{"} silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of {"}discs{"}. Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.",

keywords = "Electrodeposition, Gold, Membrane, Membrane sensor, Poly-electrolyte, Silica, Sputter-coating, Tin-doped indium oxide, Voltammetry",

author = "Anne Vuorema and Mika Sillanp{\"a}{\"a} and Edler, \{Karen J.\} and Robben Jaber and Dale, \{Sara E.C.\} and Simon Bending and Yunfeng Gu and Kamran Yunus and Fisher, \{Adrian C.\} and Frank Marken",

year = "2012",

month = jun,

doi = "10.1002/elan.201200141",

language = "English",

volume = "24",

pages = "1296--1305",

journal = "Electroanalysis",

issn = "1040-0397",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - Mesoporous Silica Sputter-Coated onto ITO

T2 - Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

AU - Vuorema, Anne

AU - Sillanpää, Mika

AU - Edler, Karen J.

AU - Jaber, Robben

AU - Dale, Sara E.C.

AU - Bending, Simon

AU - Gu, Yunfeng

AU - Yunus, Kamran

AU - Fisher, Adrian C.

AU - Marken, Frank

PY - 2012/6

Y1 - 2012/6

N2 - "Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

AB - "Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

KW - Electrodeposition

KW - Gold

KW - Membrane

KW - Membrane sensor

KW - Poly-electrolyte

KW - Silica

KW - Sputter-coating

KW - Tin-doped indium oxide

KW - Voltammetry

UR - https://www.scopus.com/pages/publications/84861859518

U2 - 10.1002/elan.201200141

DO - 10.1002/elan.201200141

M3 - Article

AN - SCOPUS:84861859518

SN - 1040-0397

VL - 24

SP - 1296

EP - 1305

JO - Electroanalysis

JF - Electroanalysis

IS - 6

ER -

Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

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