Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Anne Vuorema; Mika Sillanpää; Karen J. Edler; Robben Jaber; Sara E.C. Dale; Simon Bending; Yunfeng Gu; Kamran Yunus; Adrian C. Fisher; Frank Marken

doi:10.1002/elan.201200141

Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Anne Vuorema, Mika Sillanpää, Karen J. Edler, Robben Jaber, Sara E.C. Dale, Simon Bending, Yunfeng Gu, Kamran Yunus, Adrian C. Fisher, Frank Marken

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

"Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)₆^4- in aqueous KNO₃ strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

Original language	English
Pages (from-to)	1296-1305
Number of pages	10
Journal	Electroanalysis
Volume	24
Issue number	6
DOIs	https://doi.org/10.1002/elan.201200141
Publication status	Published - Jun 2012
Externally published	Yes

Keywords

Electrodeposition
Gold
Membrane
Membrane sensor
Poly-electrolyte
Silica
Sputter-coating
Tin-doped indium oxide
Voltammetry

ASJC Scopus subject areas

Analytical Chemistry
Electrochemistry

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10.1002/elan.201200141

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@article{9fd23586ec4d4365b169dd8451088e3c,

title = "Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores",

abstract = "{"}Simple{"} silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of {"}discs{"}. Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.",

keywords = "Electrodeposition, Gold, Membrane, Membrane sensor, Poly-electrolyte, Silica, Sputter-coating, Tin-doped indium oxide, Voltammetry",

author = "Anne Vuorema and Mika Sillanp{\"a}{\"a} and Edler, \{Karen J.\} and Robben Jaber and Dale, \{Sara E.C.\} and Simon Bending and Yunfeng Gu and Kamran Yunus and Fisher, \{Adrian C.\} and Frank Marken",

year = "2012",

month = jun,

doi = "10.1002/elan.201200141",

language = "English",

volume = "24",

pages = "1296--1305",

journal = "Electroanalysis",

issn = "1040-0397",

publisher = "Wiley-VCH Verlag",

number = "6",

}

TY - JOUR

T1 - Mesoporous Silica Sputter-Coated onto ITO

T2 - Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

AU - Vuorema, Anne

AU - Sillanpää, Mika

AU - Edler, Karen J.

AU - Jaber, Robben

AU - Dale, Sara E.C.

AU - Bending, Simon

AU - Gu, Yunfeng

AU - Yunus, Kamran

AU - Fisher, Adrian C.

AU - Marken, Frank

PY - 2012/6

Y1 - 2012/6

N2 - "Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

AB - "Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.

KW - Electrodeposition

KW - Gold

KW - Membrane

KW - Membrane sensor

KW - Poly-electrolyte

KW - Silica

KW - Sputter-coating

KW - Tin-doped indium oxide

KW - Voltammetry

UR - https://www.scopus.com/pages/publications/84861859518

U2 - 10.1002/elan.201200141

DO - 10.1002/elan.201200141

M3 - Article

AN - SCOPUS:84861859518

SN - 1040-0397

VL - 24

SP - 1296

EP - 1305

JO - Electroanalysis

JF - Electroanalysis

IS - 6

ER -

Mesoporous Silica Sputter-Coated onto ITO: Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores

Abstract

Keywords

ASJC Scopus subject areas

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