Investigation on synthesis, growth, Hirshfeld surface and third order nonlinear optical properties of Urea-Succinic Acid single crystal: A potential candidate for self-defocusing lasing application

Debabrata Nayak, N. Vijayan, Manju Kumari, Kiran, Pargam Vashishtha, Subasis Das, B. Sridhar, Govind Gupta, R. P. Pant

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

A wide optical band gap Urea-Succinic Acid (USA) single crystal was grown by using slow evaporation solution growth techniques. The structural analysis of grown ingot has been assessed by single crystal X-ray diffraction and high resolution X-ray diffraction techniques respectively. The various types of intermolecular interaction for the grown single crystal were visualized by Hirshfeld surface analysis using Crystal Explorer software. The photoluminescence study of grown crystal suggests major emission occurs at 460 nm which corresponds to blue light in EM spectrum. From time resolved Photoluminescence, the bi-exponential curve of major emission photons shows a defect energy state in the band structure of the grown single crystal. The self-defocusing lasing action of the grown single crystal has been studied through Nd-YAG nanosecond laser with a 532 nm wavelength. The nonlinear optical variables like nonlinear refractive index (n2) and nonlinear absorption coefficient (β) of titled compound single crystal are evaluated from Z-scan measurement. The laser damage threshold of USA single crystal is found to be 1.69 GW/cm2 for a single shot.

Original languageEnglish
Article number112051
JournalOptical Materials
Volume124
DOIs
Publication statusPublished - Feb 2022
Externally publishedYes

Keywords

  • Laser damage threshold and nonlinearity
  • Single crystal
  • Structural
  • Time-resolved PL

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Spectroscopy
  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Inorganic Chemistry
  • Electrical and Electronic Engineering

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