TY - JOUR
T1 - Influence of TiC thin film growth morphology deposited by RF magnetron sputtering on the mechanical and tribology properties of Ti6Al4V
AU - Abegunde, Olayinka
AU - Akinlabi, Esther
AU - Oladijo, Philip
N1 - Publisher Copyright:
© 2019 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the 10th International Conference of Materials Processing and Characterization.
PY - 2019
Y1 - 2019
N2 - The research study reported the influence of RF power and temperature on the growth morphology, mechanical property and tribology behaviour of TiC thin films deposited on Ti6Al4V by RF magnetron sputtering. The RF power used was between 150 and 250 W with an interval of 50 W and the temperature was between 70 and 90 °C at an interval of 10 °C. The surface morphology and topography were examined using Field Emission Scanning Electron Microscope FESEM and Veeco Di2100Atomic force microscopy. Hysitron Triboindenter was used to evaluate the nanohardness and other mechanical properties of the TiC thin film coating. The film adhesion and coefficient of friction were analysed on an Anton Paar Microscratch Tester. The TiC thin film morphology reveals denser and equiaxed films as the sputtering process parameters increase. The surface topography is characterized with high peaks of TiC thin film and the surface roughness reduces with increase in RF power and temperature. The nanohardness of the TiC thin films increases as the RF power and temperature decrease. The film adhesion shows good resistance to delamination and peeling of the TiC thin film under microscratch test for all the samples.
AB - The research study reported the influence of RF power and temperature on the growth morphology, mechanical property and tribology behaviour of TiC thin films deposited on Ti6Al4V by RF magnetron sputtering. The RF power used was between 150 and 250 W with an interval of 50 W and the temperature was between 70 and 90 °C at an interval of 10 °C. The surface morphology and topography were examined using Field Emission Scanning Electron Microscope FESEM and Veeco Di2100Atomic force microscopy. Hysitron Triboindenter was used to evaluate the nanohardness and other mechanical properties of the TiC thin film coating. The film adhesion and coefficient of friction were analysed on an Anton Paar Microscratch Tester. The TiC thin film morphology reveals denser and equiaxed films as the sputtering process parameters increase. The surface topography is characterized with high peaks of TiC thin film and the surface roughness reduces with increase in RF power and temperature. The nanohardness of the TiC thin films increases as the RF power and temperature decrease. The film adhesion shows good resistance to delamination and peeling of the TiC thin film under microscratch test for all the samples.
KW - Mechanical properties
KW - Morphology evolution
KW - RF magnetron sputtering
KW - Surface topography
KW - TiC thin films
UR - http://www.scopus.com/inward/record.url?scp=85089019210&partnerID=8YFLogxK
U2 - 10.1016/j.matpr.2020.02.302
DO - 10.1016/j.matpr.2020.02.302
M3 - Conference article
AN - SCOPUS:85089019210
SN - 2214-7853
VL - 26
SP - 1469
EP - 1472
JO - Materials Today: Proceedings
JF - Materials Today: Proceedings
T2 - 10th International Conference of Materials Processing and Characterization, ICMPC 2020
Y2 - 21 February 2020 through 23 February 2020
ER -