@inproceedings{e63f74f710dd4026a5ccc11f8764a3df,
title = "Improvement of Atomic Layer Deposition Quality Control Method",
abstract = "Atomic layer deposition (ALD) can be used in the fabrication of new materials, optimization of battery electrode surfaces and many other fields. Data-driven quality control method of ALD was studied in this paper, including quality inspection based on image segmentation and quality prediction based on decision tree. The results showed that the algorithms designed in this paper were effective and provided new solutions for the improvement of ALD.",
keywords = "atomic layer deposition, decision tree, film quality, image segmentation",
author = "Jihong Yan and Shenyi Yan and Pengxiang Wang and Jen, {Tien Chien}",
note = "Publisher Copyright: {\textcopyright} 2020 IEEE.; 3rd International Conference on Power and Energy Applications, ICPEA 2020 ; Conference date: 09-10-2020 Through 11-10-2020",
year = "2020",
month = oct,
day = "9",
doi = "10.1109/ICPEA49807.2020.9280143",
language = "English",
series = "2020 3rd International Conference on Power and Energy Applications, ICPEA 2020",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "41--45",
booktitle = "2020 3rd International Conference on Power and Energy Applications, ICPEA 2020",
address = "United States",
}