Hypervalence and the delocalizing versus localizing propensities of H 3-, Li3-, CH5- And SiH5-

Simon C.A.H. Pierrefixe, F. Matthias Bickelhaupt

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

Lithium and silicon have the capability to form hypervalent structures, such as Li3- and SiH5 -, which is contrasted by the absence of this capability in hydrogen and carbon, as exemplified by H3- and CH5- which, although isoelectronic to the former two species, have a distortive, bond-localizing propensity. This well-known fact is nicely confirmed in our DFT study at BP86/TZ2P. We furthermore show that the hypervalence of Li and Si neither originates from the availability of low-energy 2p and 3d AOs, respectively, nor from differences in the bonding pattern of the valence molecular orbitals; there is, in all cases, a 3-center-4-electron bond in the axial X-A-X unit. Instead, we find that the discriminating factor is the smaller effective size of C compared to the larger Si atom, and the resulting lack of space around the former. Interestingly, a similar steric mechanism is responsible for the difference in bonding capabilities between H and the effectively larger Li atom. This is so, despite the fact that the substituents in the corresponding symmetric and linear dicoordinate H3- and Li3- are on opposite sides of the central atom.

Original languageEnglish
Pages (from-to)813-819
Number of pages7
JournalStructural Chemistry
Volume18
Issue number6
DOIs
Publication statusPublished - Dec 2007
Externally publishedYes

Keywords

  • Carbon
  • Density functional calculations
  • Hydrogen
  • Hypervalence
  • Lithium
  • Silicon

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

Fingerprint

Dive into the research topics of 'Hypervalence and the delocalizing versus localizing propensities of H 3-, Li3-, CH5- And SiH5-'. Together they form a unique fingerprint.

Cite this