Abstract
Miniaturization remains a critical challenge for Negative Group Delay (NGD) circuit design. This brief presents an inductorless bandpass (BP) NGD integrated circuit (IC) designed based on an RC-topology leveraging 180-nm complementary metal-oxide-semiconductor (CMOS) technology. The schematic and layout of the BP-NGD CMOS IC prototype are designed with CADENCE VIRTUOSO (Registered trademark.) commercial tool. The compact BP-NGD chip area is 1.06 mm ×0.55 mm. The key performance metrics include a center frequency of 18.67 MHz, an NGD of -0.91 ns, a bandwidth of 74.31 MHz, a maximum insertion loss of -3.86 dB, and a minimum return loss of -11.04 dB. The results demonstrate that the IC design effectively balances miniaturization with high-performance NGD characteristics, providing a promising solution for NGD integration in system-on-chip (SoC) applications.
| Original language | English |
|---|---|
| Pages (from-to) | 63-67 |
| Number of pages | 5 |
| Journal | IEEE Transactions on Circuits and Systems II: Express Briefs |
| Volume | 73 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2026 |
Keywords
- 180-nm CMOS technology
- Bandpass (BP)
- inductorless topology
- integrated circuit (IC)
- negative group delay (NGD)
ASJC Scopus subject areas
- Electrical and Electronic Engineering
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