Evolution of surface roughness and mechanical properties of Sputtered Aluminum thin films

F. M. Mwema, E. T. Akinlabi, O. P. Oladijo

Research output: Contribution to journalConference articlepeer-review

Abstract

In this work, aluminum thin films were sputtered on steel substrates at a varying substrate temperature ranging between 40 and 100 degrees Celsius. The films were characterized for microstructure by field emission scanning electron microscope, topography by atomic force microscope, mechanical properties by nanoindentation and the results related to the wear behavior of the films under very high sliding load of 30 N. The mechanism of failure of such films were observed and the relationship between the substrate temperature and sliding failure discussed. The study is important in understanding the failure mechanisms and improvement of the surface properties of sputtered aluminum thin films.

Original languageEnglish
Article number032093
JournalJournal of Physics: Conference Series
Volume1378
Issue number3
DOIs
Publication statusPublished - 18 Dec 2019
Event3rd International Conference on Engineering for Sustainable World, ICESW 2019 - Ota, Nigeria
Duration: 3 Jul 20198 Jul 2019

Keywords

  • Aluminum
  • sputtering
  • temperature
  • thin films
  • wear

ASJC Scopus subject areas

  • General Physics and Astronomy

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