Effect of oxygen partial pressure during pulsed laser deposition on the emission of Eu doped ZnO thin films

Vinod Kumar, O. M. Ntwaeaborwa, H. C. Swart

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

Eu3+ doped ZnO (ZnO:Eu3+) thin films were prepared by pulsed laser deposition at different oxygen partial pressures. The all ZnO:Eu3+ thin films have a hexagonal structure. The morphology and roughness of the ZnO:Eu3+ thin film were also dependent on the partial pressure of the oxygen. The strong band to band emission was observed with the weak emission of both Eu3+ and defects. The intensity of the band emission peaks has increased with an increase in the oxygen partial pressure.

Original languageEnglish
Article number411713
JournalPhysica B: Condensed Matter
Volume576
DOIs
Publication statusPublished - 1 Jan 2020
Externally publishedYes

Keywords

  • Oxygen partial pressure
  • Pulsed laser deposition
  • ZnO:Eu

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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