Dealing with interference challenge in the electrochemical detection of As(III) - A complexometric masking approach

A. O. Idris, J. P. Mafa, N. Mabuba, O. A. Arotiba

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)

Abstract

Copper ion has been reported to be a major interference in the electrochemical detection of arsenic (III) ion in water. Therefore the development of a simple approach to alleviate this interference challenge is important. We present the use of ammonia solution as a masking agent for Cu(II) interference in the square wave anodic stripping voltammetry of As(III) on a gold nanoparticle modified glassy carbon electrode (GCE). AuNPs were electrochemically deposited by cyclic voltammetry on a GCE from a potential range of - 400 mV to 1100 mV for 10 cycles. Square wave anodic stripping voltammetry (SWASV) was used to detect As(III) in water with and without Cu(II) based on the following optimised conditions: pH = 3, deposition potential = - 600 mV, and deposition time = 60 s. Ammonia solution was added to the analyte solution and the effect on mitigating copper interference was studied. The presence of ammonia complexed the Cu(II) ion thereby excluding Cu(II) from interfering with the As(III) signal.

Original languageEnglish
Pages (from-to)18-20
Number of pages3
JournalElectrochemistry Communications
Volume64
DOIs
Publication statusPublished - 1 Mar 2016

Keywords

  • Arsenic (III) ion
  • Complexometric masking
  • Copper (II) ion
  • Interference
  • Square wave anodic stripping voltammetry

ASJC Scopus subject areas

  • Electrochemistry

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