Comparison of Al and Cu interconnects using VHDL-AMS and SPICE modeling

Saurabh Chaturvedi, Mladen Bozanic, Saurabh Sinha

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper compares the transient characteristics of aluminum (Al) and copper (Cu) microstrip line structures. Interconnects are represented using distributed resistance inductance capacitance (RLC) transmission line (TL) model. The equivalent RLC-ladder networks for Al and Cu interconnects are first implemented using VHDL-AMS, and their time-domain simulation responses are compared. For the verification of the results obtained from VHDL-AMS implementation, the process is repeated with SPICE modeling. Both the simulation results are in good agreement.

Original languageEnglish
Title of host publicationProceedings of the 2016 2nd International Conference on Contemporary Computing and Informatics, IC3I 2016
EditorsV N Manjunatha Aradhya, S K Niranjan
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages590-593
Number of pages4
ISBN (Electronic)9781509052554
DOIs
Publication statusPublished - 2016
Event2nd International Conference on Contemporary Computing and Informatics, IC3I 2016 - Noida, India
Duration: 14 Dec 201617 Dec 2016

Publication series

NameProceedings of the 2016 2nd International Conference on Contemporary Computing and Informatics, IC3I 2016

Conference

Conference2nd International Conference on Contemporary Computing and Informatics, IC3I 2016
Country/TerritoryIndia
CityNoida
Period14/12/1617/12/16

Keywords

  • Microstrip line
  • RLC model
  • SPICE
  • VHDL-AMS
  • inductive effects

ASJC Scopus subject areas

  • Artificial Intelligence
  • Information Systems and Management
  • Health Informatics
  • Computer Networks and Communications
  • Computer Science Applications
  • Information Systems

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