Atomic layer deposited (ALD) TiO2 and TiO2-x-N x thin film photocatalysts in salicylic acid decomposition

S. H. Vilhunen; M. E.T. Sillanpää

doi:10.2166/wst.2009.660

Atomic layer deposited (ALD) TiO₂ and TiO_2-x-N _x thin film photocatalysts in salicylic acid decomposition

S. H. Vilhunen, M. E.T. Sillanpää

University of Eastern Finland

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO₂) and nitrogen-doped TiO₂ (TiO _2-x-N_x) combined with ultraviolet (UV) radiation was studied. TiO₂ film with thickness of 15 and 65nm was tested. The TiO_2-x-N_x film had thickness of 15nm on top of TiO ₂ (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.

Original language	English
Pages (from-to)	2471-2475
Number of pages	5
Journal	Water Science and Technology
Volume	60
Issue number	10
DOIs	https://doi.org/10.2166/wst.2009.660
Publication status	Published - 2009
Externally published	Yes

Keywords

Atomic layer deposition
Nitrogen-doping
Salicylic acid
Titanium dioxide
Ultraviolet light

ASJC Scopus subject areas

Environmental Engineering
Water Science and Technology

Access to Document

10.2166/wst.2009.660

Cite this

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title = "Atomic layer deposited (ALD) TiO2 and TiO2-x-N x thin film photocatalysts in salicylic acid decomposition",

abstract = "Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO2) and nitrogen-doped TiO2 (TiO 2-x-Nx) combined with ultraviolet (UV) radiation was studied. TiO2 film with thickness of 15 and 65nm was tested. The TiO2-x-Nx film had thickness of 15nm on top of TiO 2 (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.",

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