Applications of AES, XPS and TOF SIMS to phosphor materials

H. C. Swart; J. J. Terblans; O. M. Ntwaeaborwa; R. E. Kroon; E. Coetsee; I. M. Nagpure; Vijay Kumar; Vinod Kumar; Vinay Kumar

doi:10.1002/sia.5393

Applications of AES, XPS and TOF SIMS to phosphor materials

H. C. Swart, J. J. Terblans, O. M. Ntwaeaborwa, R. E. Kroon, E. Coetsee, I. M. Nagpure, Vijay Kumar, Vinod Kumar, Vinay Kumar

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

The important role of Auger electron spectroscopy (AES), X-ray photo electron spectroscopy (XPS) and time of flight secondary ion mass spectrometry (TOF-SIMS) to characterize different phosphor materials is pointed out with examples. AES is used to monitor surface reactions during electron bombardment and also to determine the elemental composition of the surfaces of the materials, while XPS and TOF-SIMS are used for the surface chemical composition and valence state of the dopants.

Original language	English
Pages (from-to)	1105-1109
Number of pages	5
Journal	Surface and Interface Analysis
Volume	46
Issue number	10-11
DOIs	https://doi.org/10.1002/sia.5393
Publication status	Published - 1 Oct 2014
Externally published	Yes

Keywords

AES
TOF-SIMS
XPS

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1002/sia.5393

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title = "Applications of AES, XPS and TOF SIMS to phosphor materials",

abstract = "The important role of Auger electron spectroscopy (AES), X-ray photo electron spectroscopy (XPS) and time of flight secondary ion mass spectrometry (TOF-SIMS) to characterize different phosphor materials is pointed out with examples. AES is used to monitor surface reactions during electron bombardment and also to determine the elemental composition of the surfaces of the materials, while XPS and TOF-SIMS are used for the surface chemical composition and valence state of the dopants.",

keywords = "AES, TOF-SIMS, XPS",

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T1 - Applications of AES, XPS and TOF SIMS to phosphor materials

AU - Swart, H. C.

AU - Terblans, J. J.

AU - Ntwaeaborwa, O. M.

AU - Kroon, R. E.

AU - Coetsee, E.

AU - Nagpure, I. M.

AU - Kumar, Vijay

AU - Kumar, Vinod

AU - Kumar, Vinay

PY - 2014/10/1

Y1 - 2014/10/1

N2 - The important role of Auger electron spectroscopy (AES), X-ray photo electron spectroscopy (XPS) and time of flight secondary ion mass spectrometry (TOF-SIMS) to characterize different phosphor materials is pointed out with examples. AES is used to monitor surface reactions during electron bombardment and also to determine the elemental composition of the surfaces of the materials, while XPS and TOF-SIMS are used for the surface chemical composition and valence state of the dopants.

AB - The important role of Auger electron spectroscopy (AES), X-ray photo electron spectroscopy (XPS) and time of flight secondary ion mass spectrometry (TOF-SIMS) to characterize different phosphor materials is pointed out with examples. AES is used to monitor surface reactions during electron bombardment and also to determine the elemental composition of the surfaces of the materials, while XPS and TOF-SIMS are used for the surface chemical composition and valence state of the dopants.

KW - AES

KW - TOF-SIMS

KW - XPS

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U2 - 10.1002/sia.5393

DO - 10.1002/sia.5393

M3 - Article

AN - SCOPUS:84908222100

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VL - 46

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EP - 1109

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

IS - 10-11

ER -

Applications of AES, XPS and TOF SIMS to phosphor materials

Abstract

Keywords

ASJC Scopus subject areas

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