Abstract
Here we present the fabrication of a multilayer resistive memory device (ReRAM) utilizing AlCr2O4/MXene nanocomposite. Comprehensive investigations into the structural and morphological properties of the nanostructures were conducted using various characterization techniques. The fabricated device was tested by measuring I-V characteristics at different current applications which encompasses all previous results. The band gap value for the nanocomposite was reduced to 2.42 eV while that for AlCr2O4 was measured at 3.25 eV via photoluminescence spectrum. Average particle size of the AlCr2O4/MXene nanocomposite was determined to be 25 nm through powder X-ray diffraction analysis. Crystallographic analysis revealed that all crystal peaks conform to the R-3c (167) space group, indicative of a standard hexagonal crystal structure. Energy-dispersive X-ray readings provided further confirmation that all required elements are present in the sample, affirming successful synthesis of the nanocomposite. Notably, the nanocomposite demonstrated exceptional performance as an electrode material in ReRAM, as evidenced by its current-voltage characteristics, making the AlCr2O4/MXene nanocomposite suitable for a wide range of next-generation device applications.
Original language | English |
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Article number | 064001 |
Journal | ECS Journal of Solid State Science and Technology |
Volume | 13 |
Issue number | 6 |
DOIs | |
Publication status | Published - Jun 2024 |
Externally published | Yes |
Keywords
- EDX
- ReRAM
- nanocomposites
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials